Physical Vapor Deposition (PVD) technology with multiple sources. Fully automated, robust and flexible thin film deposition system. R&D or production coating applications. Multiple options and features including, load-lock, Ion Assisted Deposition (IAD), substrate fixtures and more.
Physical Vapor Deposition (PVD) technology with standard and specialized sources such as Indium. Supports various evaporation sources, substrates and processes. R&D or production coating applications. User friendly automated interface with adapted recipes to customer processes.
High-vacuum plasma-enhanced chemical vapor deposition (PECVD) system for Diamond-like-Carbon (DLC) coatings. R&D and small scale production. Customized substrate fixtures. “One button” operation, fully automated system for high accuracy deposition.
High and Ultra-high vacuum furnaces from 350°c to 1,100°c. R&D or production coating applications. High temperature uniformity and automated control system. Independently heated multiple shelves for outstanding double-sided coating uniformity.
Holders & Positions
Excellent Uniformity &
Easy to Operate, Unlimited Process
Recipes, Data Logging & Real Time
Flexible Configuration &
High End Components
Easy to Service & Remote